| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 |
| filingDate |
1982-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1984-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3ad8f53dc4f4dddedbbc0585544db85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b6b52664e363fb8fa80e07051b92ea9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aab5e4f899ea6f5f1505a04be8cd43f1 |
| publicationDate |
1984-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4464458-A |
| titleOfInvention |
Process for forming resist masks utilizing O-quinone diazide and pyrene |
| abstract |
A resist system for semiconductor device fabrication comprised of bottom positive resist layer of a diazoquinone/novolak resist applied to a substrate and overcoated with a like or different diazoquinone/novolak top resist layer which has been sensitized with pyrene and/or its derivatives. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5747216-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4863827-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6322953-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8607473-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5118582-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11143961-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4578344-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5290656-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4571374-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6187515-B1 |
| priorityDate |
1982-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |