| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b120cb3adbb572c76c6eda7c142a416 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
1982-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1983-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef3a2d840095a263767877470d45704d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_405cff10ec92f8befc604e4201c99c9d |
| publicationDate |
1983-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4405406-A |
| titleOfInvention |
Plasma etching process and apparatus |
| abstract |
A plasma etching process and apparatus wherein a gas plasma comprising dichlorofluoro-methane (CHCl 2 F) etches a film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4975144-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2335795-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4582581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6177147-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2217108-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2335795-B |
| priorityDate |
1980-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |