| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e200333435c7483e44b0f1cd91e43cec |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02576
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-0621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1876 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B7-12 |
| filingDate |
1980-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1982-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c332933aa90fbe20c76fc6038166df76 |
| publicationDate |
1982-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4341610-A |
| titleOfInvention |
Energy efficient process for continuous production of thin semiconductor films on metallic substrates |
| abstract |
An energy efficient process is disclosed for the continuous production of semiconductor matrices formed from electrodepositing doped silicon or germanium films on metallic sheet substrates. The energy released from such electrodeposition can then be used to regenerate the anode material used in the electrodepositing position. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010263734-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8425855-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113215420-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6951770-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011027160-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0316560-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8875728-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003160243-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8235305-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03085747-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03085747-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0178156-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010215562-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168123-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2838236-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8158093-B2 |
| priorityDate |
1978-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |