| abstract |
An aqueous organic amine acid gas scrubbing system, particularly an aqueous N-methyldiethanolamine or diethanolamine acid gas scrubbing system having incorporated therein (1) a compound or mixture of compounds having the formula <IMAGE> wherein n is an integer from 1 to 3, m is an integer from 2 to a number sufficient to yield a molecular weight of about 800, R1, R2, R3 and R4 are each independently selected from the group consisting of -H, -Cn'H2n'OH, -Cn'H2n'+1, -Cn'H2n'N(R3)R4 wherein n' is an integer from 1 to 2 and wherein R1-R3 and R2-R4 may be joined to form cyclic amines when n is 2; said compound being present in about 10 to about 2000 parts per million parts of treating solution; (2) copper or a copper ion yielding compound in from 0 to 1000 ppm; and (3) sulfur or a sulfur atom yielding compound in from 0 to 1000 ppm. |