| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
1976-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1978-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04ad5944f0f2203f99dd62f1e2f61346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570bff0ef5de6c28b7cac91d1fcfda5e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51ce61a325ffc1fba4f1cc2456d97255 |
| publicationDate |
1978-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4091169-A |
| titleOfInvention |
Silicon oxide/silicon nitride mask with improved integrity for semiconductor fabrication |
| abstract |
A semiconductor dielectric layer formed of silicon nitride having a uniform dispersion of carbon therein for providing reduced intrinsic tensile stresses of less than 10 × 10 9 dyn/cm 2 . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4888988-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003160026-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5565697-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003207588-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7629257-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009137132-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7595010-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6864188-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007048906-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008054228-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100923040-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4155802-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5310446-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501355-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6242045-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8148191-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100547732-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4587171-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4254161-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009071540-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7951730-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008014761-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006286817-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7462376-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005287747-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4289801-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03034504-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5459346-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6503557-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004242019-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4333964-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4870745-A |
| priorityDate |
1975-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |