| abstract |
A patterned deposit of a metal-containing organic material is produced on a substrate by an electron beam cross-linking process. The starting material contains ferrocene (di- pi cyclopentadienyl iron) or organic groups of the class of ferrocene, where Ni, Co, V, Cr and Ti can be included in place of iron. The electron beam is directed against either a film adsorbed on the substrate from the vapor phase or a polymer film deposited on the substrate from a solution of a polymer with ferrocene substituents. The cross-linked product film can be used, for example, as a high resolution mask for semiconductor and microcircuit processing. The heavy metal content of the film makes it useful as an ion implantation mask and for nucleation of the electroless deposition of an additional metallic layer for direct generation of a conductor pattern. |