| abstract |
There is a substrate support for use in a plasma processing apparatus, the substrate support comprising: a base; a ceramic plate disposed on the base, the ceramic plate having a substrate supporting region and a ring supporting region surrounding the substrate supporting region; an insulating annular member disposed around the base and the ceramic plate; a fixed edge ring having an inner portion and an outer portion, the inner portion being supported on the ring supporting region, the outer portion being supported on the insulating annular member, the outer portion having a first width; a movable edge ring disposed above the outer portion of the fixed edge ring, the movable edge ring having a second width smaller than the first width; and an actuator configured to vertically move the movable edge ring with respect to the fixed edge ring. |