| abstract |
Provided is a pressure-sensitive adhesive sheet for protecting a semiconductor element that appropriately protects a semiconductor wafer without reducing a yield. The pressure-sensitive adhesive sheet for protecting a semiconductor element includes: a pressure-sensitive adhesive layer; and a base material. The pressure-sensitive adhesive layer has a surface resistivity of 1.0×10 11 Ω/□ or less. After the pressure-sensitive adhesive layer and a silicon wafer have been bonded to each other, and have been left at rest at 50° C. for 24 hours, and the pressure-sensitive adhesive sheet has been peeled from the silicon wafer, a halogen element ratio with respect to a total element content of a surface of the silicon wafer that was bonded to the pressure-sensitive adhesive layer is 0.3 atomic % or less. |