| abstract |
A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an α-position of Ct constitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), W2 represents a polymerizable group-containing group, Wa2 represents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3 |