| abstract |
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed due to action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to action of an acid, and an acid generator component which generates an acid upon light exposure, in which the base material component contains a polymer compound which has a constitutional unit containing an acid-dissociable group represented by Formula (a01-r-1), and the acid generator component contains a compound represented by Formula (b1) but does not contain an onium salt having a halogen atom in an anion moiety. In the formula, R 01 represents an alkyl group having 4 or more carbon atoms, n represents an integer of 1 to 4, Rb 1 represents a hydrocarbon group which may have a substituent and does not have a halogen atom, and M m+ represents an m-valent organic cation |