| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a62555ff12316a9a118542896b4c0af7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 |
| filingDate |
2017-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68d8a3c4e41d96bb66359e240d2c703d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_415d90c7589e38c2a8fc156128efbbb1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdec42abde7c158707681fde46b63ab5 |
| publicationDate |
2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2019011831-A1 |
| titleOfInvention |
Method for Manufacturing Display Substrate |
| abstract |
The present disclosure provides a method for manufacturing a display substrate, relating to the field of manufacturing technology for display substrate, and can address at least in part a problem of insufficient flatness of a planarization layer, complex manufacturing process and high cost of a prior art display substrate. The method for manufacturing a display substrate according to the present disclosure includes: forming a curable material layer on a base, the base having a first structure; performing imprinting on the curable material layer using a nano-imprinting mold, so that the curable material layer is planarized, and at the same time a through hole connected to the first structure is formed in the curable material layer; curing the curable material layer to form a planarization layer; and forming a second structure connected to the first structure via the through hole. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110828520-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11526074-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111293147-A |
| priorityDate |
2016-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |