Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b8b2ec30f41266773d22a903d3f1e962 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45576 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
filingDate |
2016-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a98948c465b1ec18c27b3935b6591559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0f74eb18241693d83a0ef578545b3bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60757ab22fbaba4da6d6de7f75bc08de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36f8a8c4950971468a7e14c3ad10834a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5370f10e01823fc1f88079e60d189b3 |
publicationDate |
2018-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2018119277-A1 |
titleOfInvention |
Gas Distribution Apparatus for Deposition System |
abstract |
The invention provides a gas distribution apparatus or injector in a reaction chamber comprising multiple diffusion plates arranged substantially parallel and at least one bump with slopes and substantially flat top/bottom surface to introduce at least two different reaction gases horizontally and separately into the reaction chamber while preventing condensation of adduct formed due to mixture of the reaction gases at a low temperature by avoiding back diffusion. Meanwhile any turbulence or vortex of the reaction gases is not caused because slope shape is formed at the bump. |
priorityDate |
2016-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |