| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d311ba6751380247753979ecd838ff7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6d92b6b88371f2ac680930037339c257
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fbccb769a62cfdbef566ca7525a6bef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d51b723a2d8eb04c7a282a4cc006b70a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02538
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45514
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45508 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2011-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1ebcb541d1ee1bc99ea921630d3a823
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f40c005bb25cfe4f63c87661669bbf65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31f1405c554daa7bd1f03a8c5cb37e15 |
| publicationDate |
2013-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013180454-A1 |
| titleOfInvention |
Thin film deposition apparatus |
| abstract |
Provided is a thin film deposition apparatus which comprises a chamber, a susceptor, a source gas supply part, and a susceptor support. The chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the chamber to directly support a plurality of substrates along a circumference of a center of a top surface or support a substrate holder on which at least one substrate is disposed. The source gas supply part supplies first and second source gases into a central portion of an upper side of the susceptor in a state where the first and second gases are separated from each other. Also, the source gas supply part respectively injects the first and second source gases separated from each other toward a circumference of the susceptor through vertically arranged source gas injection holes to supply the first and second source gases onto the substrates disposed on the susceptor. The susceptor support is configured to support a center of the susceptor from a lower side of the susceptor. Also, the susceptor support includes an additional gas supply part for injecting an additional gas introduced from the outside onto a top surface of the susceptor. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10381461-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018119277-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9890473-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016002821-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9855575-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016244876-A1 |
| priorityDate |
2010-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |