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filingDate 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017194199-A1
titleOfInvention Interconnection structure and method of forming the same
abstract An interconnection structure includes a non-insulator structure, a liner layer, a dielectric structure, a conductive structure and an anti-adhesion layer. The liner layer is present on the non-insulator structure and has an opening therein. The dielectric structure is present on the liner layer. The dielectric structure includes a via opening therein. The via opening has a sidewall. The conductive structure is present in the via opening of the dielectric structure and electrically connected to the non-insulator structure through the opening of the liner layer. The anti-adhesion layer is present between the sidewall of the via opening of the dielectric structure and the conductive structure.
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