http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017018632-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2016-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa08dd1ce9b0d4cda7b7aef3d0448f94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa6d400b8208f822063d7aa61303a6d6
publicationDate 2017-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017018632-A1
titleOfInvention Semiconductor device, method for manufacturing semiconductor device, and method for forming oxide film
abstract One embodiment of the present invention is a semiconductor device at least including an oxide semiconductor film, a gate insulating film in contact with the oxide semiconductor film, and a gate electrode overlapping with the oxide semiconductor film with the gate insulating film therebetween. The oxide semiconductor film has a spin density lower than 9.3×10 16 spins/cm 3 and a carrier density lower than 1×10 15 /cm 3 . The spin density is calculated from a peak of a signal detected at a g value (g) of around 1.93 by electron spin resonance spectroscopy. The oxide semiconductor film is formed by a sputtering method while bias power is supplied to the substrate side and self-bias voltage is controlled, and then subjected to heat treatment.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019005822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I758083-B
priorityDate 2012-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009020753-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006110867-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011042670-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577455
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23958
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577454
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID12748
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID12747
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577453
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID558981
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID301434
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID158605
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450964499
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577451
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID100858576
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID1195
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID9894
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23951
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447573583
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID365842
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578761
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID30140
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23992
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327157
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID512737
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID850950
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23988
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID425060
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID10229
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359967
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID459865
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID457364
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID78989
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID150906
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583173
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23942
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453263778
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16217673
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69667
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415776239
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425270609
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23929
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577458
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82895
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449789534
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID613808
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID490427
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17979268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23980
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098968
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID1196
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577457
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583146
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23912
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23961
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577456

Total number of triples: 82.