| abstract |
The invention is directed to a method for inhibiting or preventing delamination at the interface of the die attach/mold compound and the die pad of a semiconductor device and a semiconductor device formed by such method. The method includes providing a leadframe having a top surface; coating said top surface of said leadframe with first and second silane coating; heating said silane coatings to form a pourous layer having a porosity of at least 10%; applying a die to said pourous layer; securing said die to said pourous layer by a die attaching compound; and after the curing of die attach material and wire bonding, a mold compound is applied through molding. |