| abstract |
It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. n The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. n n n n n n n n n n (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.) |