http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016079096-A1

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filingDate 2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8ce66455fa06538da52fba075429a03
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publicationDate 2016-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016079096-A1
titleOfInvention Wet Clean Process for Cleaning Plasma Processing Chamber Components
abstract A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021126889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019070639-A1
priorityDate 2014-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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