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filingDate 2015-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015279659-A1
titleOfInvention Vapor phase growth apparatus and vapor phase growth method
abstract A vapor phase growth apparatus according to embodiments includes: a reaction chamber; a first reservoir container storing a first organic metal; a source gas supply passage receiving a main carrier gas and supplying a source gas containing the first organic metal to the reaction chamber; a thermostatic room containing the first reservoir container and configured to have an internal temperature set higher than an external temperature thereof; a first carrier gas supply passage supplying a first carrier gas to the first reservoir container; a first organic metal-containing gas transfer passage connected outside the thermostatic room to the source gas supply passage to transfer a first organic metal-containing gas containing the first organic metal generated by bubbling or sublimation in the first reservoir container; and a dilution gas transfer passage connected inside the thermostatic room to the first organic metal-containing gas transfer passage transferring a dilution gas.
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