| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-243
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
2003-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2af1b0defdc13904e50bf397daed4083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7befca9bb6647704a9f53f3c736024d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dd547c52b6c8b245adc8770e0fb4055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f03f8e882ba656fd2375b98ecda8f5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4c8707efda49a1706cbfd2b17274d71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70068c5281c8dcc76ff5a4ad56a927da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cac8efc001d655f7cd1ebe20c406e5a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b482e489c69fafd7f6caff3d780e0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11a36d630535625781a85881f8730014 |
| publicationDate |
2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004062862-A1 |
| titleOfInvention |
Method and apparatus using large-area organic vapor deposition for formation of organic thin films or organic devices |
| abstract |
Provided are an apparatus and method using large-area organic vapor phase deposition for formation of organic thin films and organic devices. The apparatus includes a deposition part and a source part. The deposition part includes a process chamber; a substrate holder installed in the process chamber for supporting a loaded substrate; a substrate temperature controller installed in the substrate holder for controlling the temperature of the substrate; and a shower head installed opposite the substrate holder in the process chamber for uniformly distributing onto the substrate organic source vapors to be used for a deposition reaction. The source part includes a source chamber for generating organic source vapors to be supplied to the shower head; a source heater which surrounds the source chamber and allows organic materials to evaporate to be organic source vapors in the source chamber; and a transfer gas supply source for supplying transfer gas that is used to transfer the organic source vapors to the process chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8808799-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1879431-A4
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9349992-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2832896-A4
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021069745-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1932937-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104520469-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010300360-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015279659-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8383194-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021050395-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11788190-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101779447-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101011961-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104947079-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006109562-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017121814-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009226604-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009041929-A1 |
| priorityDate |
2002-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |