http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015260783-A1

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filingDate 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acdec9a6ff15e6084ec6d9ac2ee81a04
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publicationDate 2015-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015260783-A1
titleOfInvention Split gate structure and method of using same
abstract A method comprises providing first and second semiconductor devices. Each device comprises a transistor having a split gate electrode including first and second gate portions. Each device has a respective ratio between an area of its first gate portion and a sum of areas of its first and second gate portions. For each device, a stress voltage is applied to the first gate portion, but not to the second gate portion. For each device, the first and second gate portions are biased with a common voltage, and data are collected indicating a respective degradation for each device due to the stress voltage. The degradation has a component due to time dependent dielectric breakdown (TDDB) and a component due to bias temperature instability. From the collected data extrapolation determines the degradation component due to TDDB.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10629526-B1
priorityDate 2011-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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