| abstract |
A semiconductor manufacturing equipment according to an embodiment includes a support unit, a chamber, a microwave generator, a waveguide, and an auxiliary heating unit. The support unit supports a wafer. The chamber accommodates the support unit therein. The microwave generator generates a microwave. The waveguide is mounted on the chamber to irradiate the microwave to a surface of the wafer. The auxiliary heating unit heats the wafer by an electromagnetic wave with a wavelength shorter than a wavelength of the microwave. |