| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-162 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-24 |
| filingDate |
2015-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_633becf8c37beb98cac7aea7eed55d74 |
| publicationDate |
2015-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015203981-A1 |
| titleOfInvention |
Component of substrate processing apparatus and method for forming a film thereon |
| abstract |
A component of a substrate processing apparatus that performs plasma processing on a substrate includes a base mainly formed of an aluminum alloy containing silicon. A film is formed on the surface of the base by an anodic oxidation process which includes connecting the component to an anode of a power supply and immersing the component in a solution mainly formed of an organic acid. The film is impregnated with ethyl silicate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107287641-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101726260-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111041538-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10260160-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10774436-B2 |
| priorityDate |
2008-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |