Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2014-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83d4ca072a20fd9dd5c679182919bb20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b01817b66af5722b789e513431ad6564 |
publicationDate |
2015-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2015162203-A1 |
titleOfInvention |
Method for etching silicon layer and plasma processing apparatus |
abstract |
Disclosed is a method of etching a silicon layer by removing an oxide film formed on a workpiece which includes the silicon layer and a mask provided on the silicon layer. The method includes: (a) forming a denatured region by generating plasma of a first processing gas containing hydrogen, nitrogen, and fluorine within a processing container accommodating the workpiece therein to denature an oxide film formed on a surface of the workpiece; (b1) removing the denatured region by generating plasma of a rare gas within the processing container; and (c) etching the silicon layer by generating plasma of a second processing gas within the processing container. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9735027-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9502537-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10067270-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016307775-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015064922-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11011386-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017219746-A1 |
priorityDate |
2013-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |