| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3720d81f95cb00f5c4e8732a7e0d343e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2014-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5970baccde9a7f48d5173cac0378f60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c941116be6852ae16ba3ab75758ef2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65211e14b288fd9eff74c2590aca663a |
| publicationDate |
2015-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015118617-A1 |
| titleOfInvention |
Negative-type photoresist composition for thick film and use thereof |
| abstract |
The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. n n n n n n n n n n (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018135515-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170024422-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11243468-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7064900-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102069143-B1 |
| priorityDate |
2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |