| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3424 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2019-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18443fb56f0942e465bb1a21b5af20fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_962132911cf911e4cb5af4b286a88959
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f50e754830e686e7715d9ac5ce275159
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e4b6b8892e8ba8bbfef8bfe2439dc70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac7a2055cefb1e7b775ebb13338a33ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd3726c45606bedd3fa574f4a8e3d8d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28822d7408eab9f123bf757caa7d3cd7 |
| publicationDate |
2022-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11243468-B2 |
| titleOfInvention |
Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method |
| abstract |
A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R 1 and R 2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R 1 and R 2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R 1 and R 2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R 1 and R 2 bond. |
| priorityDate |
2017-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |