http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015056816-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2013-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a92ab29dd77c3f28f47652ba09e565b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89024707ac582296a48232f8196f3628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2b6ada098c577a21c1e29c7663d9007
publicationDate 2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015056816-A1
titleOfInvention Semiconductor device manufacturing method and computer-readable storage medium
abstract A semiconductor device manufacturing method for etching a substrate having a multilayer film formed by alternately stacking a first film and a second film, and a photoresist layer to form a step-shaped structure is provided. The step-shaped structure is formed by repeatedly performing a first step of plasma-etching the first film by using the photoresist layer as a mask, a second step of exposing the photoresist layer formed on the substrate to a plasma generated from a processing gas containing argon gas and hydrogen gas by applying a high frequency power to a lower electrode while applying a negative DC voltage to an upper electrode, a third step of trimming the photoresist layer, and a fourth step of plasma-etching the second film.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580649-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9704878-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10153295-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10682805-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879595-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019333777-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11018021-B2
priorityDate 2012-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563231-B2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015

Total number of triples: 38.