| abstract |
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; n n n n n n n n n n where R 1 to R 5 are independently chosen from the group consisting of H and C 1 -C 6 alkyl; R 6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C 1 -C 8 ) and fluoroalkyl (C 1 -C 8 ) and W is a C 2 -C 6 alkylene spacer. |