| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_04b3c936912e63b452436473fa758a46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0efae9bfd49656818488aea119e5f39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9e47f66a7aa605e563899e2da9da4616 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K10-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L41-257 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-257
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K10-00 |
| filingDate |
2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_455ead6f6de08fd299e91fe7881c34f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d175808b3663738c1f808ae461a3ab7 |
| publicationDate |
2014-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014191618-A1 |
| titleOfInvention |
Poling treatment method, plasma poling device, piezoelectric body and manufacturing method thereof, film forming device and etching device, and lamp annealing device |
| abstract |
A plasma poling device includes a holding electrode ( 4 ) which is disposed in a poling chamber ( 1 ) and holds a substrate to be poled ( 2 ), an opposite electrode ( 7 ) which is disposed in the poling chamber and disposed facing the substrate to be poled held on the holding electrode, a power source ( 6 ) electrically connected to one electrode of the holding electrode and the opposite electrode, a gas supply mechanism supplying a plasma forming gas into a space between the opposite electrode and the holding electrode, and a control unit controlling the power source and the gas supply mechanism. The control unit controls the power source and the gas supply mechanism so as to form a plasma at a position facing the substrate to be poled and to apply a poling treatment to the substrate to be poled. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I742850-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9991134-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022376130-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021320242-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110931338-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020098595-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014262038-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10843885-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019086280-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11211242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11434095-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014172131-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11035898-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021231297-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110621638-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11155428-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11318550-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11502217-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I780687-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11756811-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10746614-B2 |
| priorityDate |
2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |