Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b20cd2bfe0fb9acdf266809d29694231 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
filingDate |
2013-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46d0469856e6c17c3eccbf0c97a546ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ada2a812f8f13ec213681dc0b9661959 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f15e1f5ab006d0dadff4b8d38c6f0e23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94a5c30c92e0c3fc52cf019ca514d598 |
publicationDate |
2014-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2014144770-A1 |
titleOfInvention |
Method of fabricating zinc oxide thin film |
abstract |
A method of fabricating a zinc oxide (ZnO) thin film in which the surface shape of the ZnO thin film can be controlled during deposition of the ZnO thin film. The method includes depositing the ZnO thin film on a substrate by chemical vapor deposition (CVD). The CVD feeds an etching gas that etches the ZnO thin film concurrently with a source gas and an oxidizer gas, thereby controlling the surface shape of the ZnO thin film that is being deposited. |
priorityDate |
2012-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |