| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2013-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cd060bc4a3d9ce9aba67e94c46a132b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c745cc5d8b5cba025d944e864981d9f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11276cd7b630770ff1eab498eaf58569
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaf9a89c75f7e55fe1f74460be886d6e |
| publicationDate |
2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014073142-A1 |
| titleOfInvention |
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium |
| abstract |
A thin film having high HF resistance and a low dielectric constant can be formed in a low temperature range with a high productivity. A thin film including a predetermined element and a borazine ring skeleton is formed on a substrate by performing a cycle a predetermined number of times. The cycle includes supplying a source gas including the predetermined element and a halogen group to the substrate and supplying a reaction gas including a borazine compound to the substrate under a condition where the borazine ring skeleton in the borazine compound is maintained. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10297506-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10340134-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017287785-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9935003-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10763101-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10083861-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9558995-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016063007-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11056353-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017076987-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018112312-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9385013-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9711348-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10818489-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10910217-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019221425-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9487861-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017148668-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9929057-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10790137-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016164932-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10410856-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10002792-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10720325-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018218897-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930491-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9721834-B2 |
| priorityDate |
2012-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |