| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3aee0dc3c2bd5ec0b538ce40a8c4489
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_61607cedaefa027f3666fd647acbc7ce |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2013-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_feed13bb27da51e2f185f71c5d0ad50a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9c773c5c696d747aef64947f0be194f |
| publicationDate |
2014-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2014065551-A1 |
| titleOfInvention |
Lithographic Pattern Development Process For Amorphous Fluoropolymer |
| abstract |
Here we disclose a lithographic pattern development process for amorphous fluoropolymers. Amorphous fluoropolymers are a class of plastic materials with high chemical inertness and favorable optical properties. Exposure of surface-deposited layers of such polymer with high energy radiation leads to a change in the chemical structure of the polymer, which selectively compromises the solubility of the exposed areas in fluorinated organic solvents. Micro- and nanopatterning with a feature size down to <50 nm was achieved by dissolving and removing unexposed amorphous fluoropolymer from exposed, surface deposited films. The amorphous fluoropolymer functions thus as a negative resist. |
| priorityDate |
2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |