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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f68caf3d0aff20d7e611cafc9cfc87a7
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publicationDate 2014-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2014016659-A1
titleOfInvention Semiconductor Device and Fabrication Method
abstract A semiconductor device is disclosed comprising: a substrate having a surface comprising germanium; a layer of gallium on said surface; and a layer of gallium arsenide on the gallium covered surface. The semiconductor heterostructure of gallium arsenide on germanium is fabricated by the steps of: protecting by a shutter a surface comprising germanium in an environment having a partial pressure of arsenic less than 10 −8 torr; epitaxially growing a layer of gallium on the said surface immediately after exposure of said surface; and epitaxially growing a layer of gallium arsenide on the gallium covered surface.
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