http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013337603-A1

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filingDate 2013-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013337603-A1
titleOfInvention Method for hydrogen plasma treatment of a transparent conductive oxide (tco) layer
abstract A method for fabricating a thin film solar device that includes providing a substrate having a transparent conductive oxide (TCO) layer deposited on a surface of the substrate, the TCO layer having an as deposited sheet resistance. At least a portion of a surface of the TCO layer is exposed to a hydrogen plasma under conditions which result in a treated TCO layer having a reduced sheet resistance which is at least 10% less than the as deposited sheet resistance.
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