| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_106f81cadca18c8722bf14d369c67bab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_416d524c7508faf796ad9bf61036243d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d131bda63e028dff27158fbf0d414423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e2bbf07645c7fbf9d27d5da18f48966b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4812c7753e86f5a940339ac9ea62632e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ab9548b7dc89966f9b3b3e1833397cb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d50eebb5fe5efa39fc84edbd40035394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_edc0cca14b1884329ad710b608c5488a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e99f90b5095ec8a4fea16d51eff0f35d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b79ab302a91bc8f6516f074fa406009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_578572dc90cdb2c4bb6a8a1d0613e6c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f667ff6e420dc253b7b56c43549ec797 |
| publicationDate |
2013-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013244178-A1 |
| titleOfInvention |
Photoresists comprising multi-amide component |
| abstract |
New photoresist compositions are provided that comprise a component that comprises two or more amide groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a multi-amide component that can function to decrease undesired photogenrated-acid diffusion out of unexposed regions of a photoresist coating layer |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022043342-A1 |
| priorityDate |
2011-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |