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publicationDate 2013-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013183836-A1
titleOfInvention Method of forming through-silicon via using laser ablation
abstract Methods of forming through-silicon vias by using laser ablation. A method includes, laser drilling to form a plurality of grooves by irradiating a laser beam onto an upper surface of a silicon wafer, and grinding a lower surface of the silicon wafer to form a plurality of through-silicon vias by exposing the grooves on the lower surface of the silicon wafer.
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