| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24471 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-12 |
| filingDate |
2012-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b01aa28b7bf33f0a4d4257c318903d1c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6667d8fb8f18bdd74c0ef446f81d6d9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3daf14576b883aa5323ed9b56f08890e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d9b200236739382cd7189c082c11f6e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_960cd2ee4ce7105d4bd17e69478bfe9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c310596c0e08ee6c894fe1a55412fdf9 |
| publicationDate |
2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013102156-A1 |
| titleOfInvention |
Components of plasma processing chambers having textured plasma resistant coatings |
| abstract |
A component of a plasma processing chamber includes a three dimensional body having a highly dense plasma resistant coating thereon wherein a plasma exposed surface of the coating has a texture which inhibits particle generation from film buildup on the plasma exposed surface. The component can be a window of an inductively coupled plasma reactor wherein the window includes a textured yttria coating. The texture can be provided by contacting the plasma exposed surface with a polishing pad having a grit size effective to provide intersecting scratches with a depth of 1 to 2 microns. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107342208-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11521830-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11017984-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111270223-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011056626-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108623330-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111164237-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019113008-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11685990-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10074521-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107574421-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018144909-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9076634-B2 |
| priorityDate |
2011-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |