| abstract |
A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, n n n n n n n n n n wherein R 3 to R 8 individually represent a group shown by the following formula (2) or the like, n —O—R 1 ≡R 2 (2)n n wherein R 1 represents a single bond or the like, and R 2 represents a hydrogen atom or the like. |