| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3625fa7db1eb35e7aa8e07de7dbceb84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52544756ae3a2d0de3c4a39685c70d8f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8dc69ab8cb2a7e3957d78f61e80c7e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a60b6f1a11c2280940ab2b78f7b987c8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09B69-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3f4a88674470cc26a459946f8c62f98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92650835f67163f3c3ac771a1ccb68cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_270fba0b24ad34f58f93a4fefcae529e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d4985e808913a7907707d9ccd913b77 |
| publicationDate |
2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012244472-A1 |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same |
| abstract |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9128376-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018217497-A1 |
| priorityDate |
2009-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |