http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012222818-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F28F1-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F28F1-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2012-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f0699cbc92dc65bbfd8edc25f7c0473
publicationDate 2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012222818-A1
titleOfInvention Substrate supporting table, substrate processing apparatus, and manufacture method for semiconductor device
abstract The substrate supporting table includes a supporting plate that supports a substrate, a peripheral wall that encompasses a flow path of a coolant under the supporting plate and has an upper end enclosed by the supporting plate, a lower cover that encloses a bottom portion of the flow path and encloses a lower end of the peripheral wall. The substrate supporting table further includes a coolant supplying component that supplies a coolant through an upstream input of the flow path, a discharging component that discharges the coolant through a downstream output of the flow path, and a partition disposed between a supplying hole of the coolant supplying component and a discharging hole of the discharging component. A gap is formed between the partition and the bottom portion of the flow path.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015013938-A1
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priorityDate 2011-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.