http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012222817-A1

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filingDate 2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9794dc2ada4810ad77b71617d26f59ca
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publicationDate 2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012222817-A1
titleOfInvention Plasma processing apparatus
abstract A plasma processing apparatus includes: a first ground member provided in processing chamber in such a way that at least a portion of the first ground member is exposed to a processing space, wherein the first ground member forms a ground potential; a second ground member provided in an exhaust space of the processing chamber to face the first ground member in such a way that at least a portion of the second ground member is exposed to the exhaust space, wherein the second ground member forms a ground potential; and a ground rod that moves up and down between the first and second ground members and contacts any one of the first or second ground member to adjust a ground state of the first or second ground member.
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priorityDate 2011-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 30.