Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ce40954ebbaae05d459801eea38eb441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93bbcb11bbb9a36f3ee31bf80f9df30f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_902a854567f25e868c58e60218646a55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32577 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9794dc2ada4810ad77b71617d26f59ca http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4fca56ecc64e9491699a0d1bb5e5d33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fec08a707eb4bd47a39f135bb822434 |
publicationDate |
2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2012222817-A1 |
titleOfInvention |
Plasma processing apparatus |
abstract |
A plasma processing apparatus includes: a first ground member provided in processing chamber in such a way that at least a portion of the first ground member is exposed to a processing space, wherein the first ground member forms a ground potential; a second ground member provided in an exhaust space of the processing chamber to face the first ground member in such a way that at least a portion of the second ground member is exposed to the exhaust space, wherein the second ground member forms a ground potential; and a ground rod that moves up and down between the first and second ground members and contacts any one of the first or second ground member to adjust a ground state of the first or second ground member. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10217613-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102585287-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022076929-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113972124-A |
priorityDate |
2011-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |