http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012205045-A1

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filingDate 2011-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012205045-A1
titleOfInvention Semiconductor machine and cleaning process thereof
abstract A semiconductor machine and a cleaning process are provided. The semiconductor machine includes a chamber and a cleaning module. The cleaning process includes the following steps. Firstly, the semiconductor machine is used to perform a semiconductor manufacturing process, wherein a titanium-based material is etched in the semiconductor manufacturing process. Then, a cleaning task is activated to clean the semiconductor machine by using a cleaning agent including a gas mixture of a fluoride compound and oxygen.
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