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publicationDate 2012-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012040508-A1
titleOfInvention Method of Forming Semiconductor Device Having Self-Aligned Plug
abstract A conductive pattern on a substrate is formed. An insulating layer having an opening exposing the conductive pattern is formed. A bottom electrode is formed on the conductive pattern and a first sidewall of the opening. A spacer is formed on the bottom electrode and a second sidewall of the opening. The spacer and the bottom electrode are formed to be lower than a top surface of the insulating layer. A data storage plug is formed on the bottom electrode and the spacer. The data storage plug has a first sidewall aligned with a sidewall of the bottom electrode and a second sidewall aligned with a sidewall of the spacer. A bit line is formed on the data storage plug.
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