http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011056515-A1

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filingDate 2010-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_275c395bdfecf092fa29810266af9daf
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publicationDate 2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011056515-A1
titleOfInvention Nf3 chamber clean additive
abstract Methods of cleaning a processing chamber with nitrogen trifluoride (NF 3 ) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NF 3 may be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NF 3 and the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF 3 .
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