| abstract |
The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. n By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. n n n n n n n n n n wherein Z + represents an organic cation, Q 1 and Q 2 each independently represent a fluorine atom or a perfluoroalkyl group, R a2 represents a divalent alicyclic hydrocarbon group pr the like, R a2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), R a3 and R a4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, R a5 represents an aliphatic hydrocarbon group, R a6 represents a divalent aliphatic hydrocarbon group, and R a7 represents an aliphatic hydrocarbon group. |