| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed89ca88042d3b6f7afc21d7b6dd7b87 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2209-017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3175
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30466 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-05 |
| filingDate |
2009-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3833186c3136d15a2f8379db0e2bdb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86240f8d465f462c850919e61c907ae2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb5651648be8dee79c7fdb48b97a9c30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53baeba6f96234f9852c17eb0d29e312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9f4e8399dd891ee01344f0b3ca12b6d |
| publicationDate |
2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010327159-A1 |
| titleOfInvention |
Ion Source Cleaning End Point Detection |
| abstract |
In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9984855-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012228489-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627180-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011079241-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102012214217-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016186913-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9934928-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8497472-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011108058-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I701697-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012119113-A1 |
| priorityDate |
2009-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |