Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-00 |
filingDate |
2010-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9e62e44f2988fbc7ab2fc2eeda0c817 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdb9025fe8b578961b25a864f9c49ebf |
publicationDate |
2010-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2010304567-A1 |
titleOfInvention |
Method of manufacturing a semiconductor device and substrate processing apparatus |
abstract |
A TiN film is formed by a first step of forming a TiN intermediate film on a wafer by supplying TiCl 4 and NH 3 reacting with TiCl 4 to the wafer and controlling a processing condition for causing a bonding branch that has not undergone a substitution reaction to remain at a predetermined concentration at a part of TiCl 4 and a second step of substituting the bonding branch contained in the TiN intermediate film by supplying H 2 to the wafer, the first step and the second step being performed in this order. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I666338-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014363903-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8937022-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9768171-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9632511-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9494947-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9631777-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9556518-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9870006-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008121180-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7900580-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10386861-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114059040-A |
priorityDate |
2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |