http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010304567-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-00
filingDate 2010-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9e62e44f2988fbc7ab2fc2eeda0c817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdb9025fe8b578961b25a864f9c49ebf
publicationDate 2010-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010304567-A1
titleOfInvention Method of manufacturing a semiconductor device and substrate processing apparatus
abstract A TiN film is formed by a first step of forming a TiN intermediate film on a wafer by supplying TiCl 4 and NH 3 reacting with TiCl 4 to the wafer and controlling a processing condition for causing a bonding branch that has not undergone a substitution reaction to remain at a predetermined concentration at a part of TiCl 4 and a second step of substituting the bonding branch contained in the TiN intermediate film by supplying H 2 to the wafer, the first step and the second step being performed in this order.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I666338-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014363903-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8937022-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9768171-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9632511-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9494947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9631777-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9556518-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9870006-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008121180-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7900580-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10386861-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114059040-A
priorityDate 2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006234502-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009130331-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008317972-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419548916
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546203
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6061
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128047203
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID37715
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527240
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24193

Total number of triples: 44.