| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c35dc31e0f008513854fb397a72146b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b91be0fb738fb2c71aa9dcc2a16bf99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91 |
| publicationDate |
2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010273110-A1 |
| titleOfInvention |
Patterning process |
| abstract |
There is disclosed a patterning process comprises at least (1) a step of forming an organic underlayer film on a substrate and then forming a photoresist pattern on the organic underlayer film, (2) a step of attaching an alkaline solution containing an alkaline substance onto the photoresist pattern and then removing the excess alkaline solution, (3) a step of applying a solution of a siloxane polymer crosslinkable by action of the alkaline substance onto the photoresist pattern to form a crosslinked part by crosslinking the siloxane polymer near the photoresist patterns, and (4) a step of removing the uncrosslinked siloxane polymer and the photoresist pattern. There can be provided a patterning process capable of forming a further finer pattern simply and efficiently and with a high practicability applicable to semiconductor manufacturing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9057960-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013191939-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I585554-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014204516-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9684240-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104471674-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9753369-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017102618-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015064613-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9164386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728715-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014038415-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013183450-A1 |
| priorityDate |
2009-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |