http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010201855-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14627 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14621 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0232 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04N5-335 |
| filingDate | 2010-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e49473d7e6f96126c787fb561b11572 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a5bb2758c9b996ca661df8645e11c54 |
| publicationDate | 2010-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2010201855-A1 |
| titleOfInvention | Solid-state imaging device, camera, electronic apparatus, and method for manufacturing solid-state imaging device |
| abstract | A method for manufacturing a solid-state imaging device, in which a photoelectric conversion portion to receive light with a light-receiving surface and generate a signal charge is disposed in a substrate, includes the steps of forming a metal light-shield layer above the substrate and in a region other than a region corresponding to the light-receiving surface, forming a light-reflection layer above the metal light-shield layer, and forming a photoresist pattern layer from a negative type photoresist film formed above the light-reflection layer, by conducting an exposing treatment and a developing treatment, wherein in the forming of the light-reflection layer, the light-reflection layer includes a shape corresponding to a pattern shape of the photoresist pattern layer, and the light-reflection layer is formed in such a way as to reflect exposure light to the photoresist film in conduction of the exposing treatment in the forming of the photoresist pattern layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014016012-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10986281-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9160953-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9735190-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015098007-A1 |
| priorityDate | 2009-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.