| abstract |
Provided are a semiconductor device and a method for manufacturing the same. The semiconductor device comprises a circuit layer, a metal interconnection layer, and a deep via. The circuit layer is formed on a semiconductor substrate. The metal interconnection layer is formed on the circuit layer. The metal interconnection layer comprises a metal interconnection connected to the circuit layer. The deep via penetrates through the semiconductor substrate and the metal interconnection layer. The deep via comprises a laser-annealed crystalline silicon. |